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Stacked Si02-Ta2O5 Gate Dielectrics for CMOS

著者名:
掲載資料名:
Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues, proceedings of the fourth International Symposium and Thin Film Materials for Advanced Packaging Technologies : proceedings of the second International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-7
発行年:
1999
開始ページ:
97
終了ページ:
103
総ページ数:
7
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772297 [156677229X]
言語:
英語
請求記号:
E23400/99-7
資料種別:
国際会議録

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