Development of Silicon Nitride Films for Gate Dielectric Applications | 東京工業大学附属図書館文献データベース

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Development of Silicon Nitride Films for Gate Dielectric Applications

著者名:

Vishnubhotla, L.

さらに 11 件

掲載資料名:

Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-6

発行年:

1999

開始ページ:

207

終了ページ:

218

総ページ数:

12

出版情報:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772280 [1566772281]

言語:

英語

請求記号:

E23400/99-6

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013936
シリーズID:	PA00000028
会議名:	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
回次:	5th
会議開催地:	Seattle, WA, USA
会議開催年:	1999.05.02-1999.05.07

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1 国際会議録 Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. … MRS-Materials Research Society	7 国際会議録 Correlation between the reliability of ultrathin ISSG SiO2 and hydrogen content Luo,T.Y., Al-Shareef,H.N., Brown,G.A., Laughery,M., Watt,V.H.C., Karamcheti,A., Jackson,M.D., Huff,H.R. SPIE-The International Society for Optical Engineering
2 国際会議録 Process and Manufacturing Challenges for High-K Gate Stack Systems Gilmer, M. C., Luo, T-Y., Huff, H. R., Jackson, M. D., Kim, S., Bersuker, G., Zeitzoff, P., Vishnubhotla, L., Brown, G. … MRS - Materials Research Society	8 国際会議録 Prospective technology for system-on-a-chip: N2 implant followed by VHP O2 reoxidation Luo,T.Y., Al-Shareef,H.N., Brown,G.A., Watt,V.H.C., Karamcheti,A., Jackson,M.D., Huff,H.R., Evans,B., Lee,C.H., … SPIE-The International Society for Optical Engineering
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