Amorphous Hydrogenated SiC Films Produced by a Dual/Mixed Frequency Plasma-Enhanced CVD Reactor

Amorphous Hydrogenated SiC Films Produced by a Dual/Mixed Frequency Plasma-Enhanced CVD Reactor

著者名:

Liaw, H.M.

掲載資料名:

Proceedings of the Symposium on Fundamental Gas-phase and Surface Chemistry of Vapor-phase Materials Synthesis

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

98-23

発行年:

1998

開始ページ:

425

終了ページ:

431

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772174 [1566772176]

言語:

英語

請求記号:

E23400/98-23

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013926
シリーズID:	PA00000028
会議名:	Symposium on Fundamental Gas-phase and Surface Chemistry of Vapor-phase Materials Synthesis
回次:	1st
会議開催地:	Boston, MA, USA
会議開催年:	1998.00.00

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