Mask Charging Effects on Feature Profile Evolution during High Density Plasma Etching
- 著者名:
- 掲載資料名:
- Proceedings of the twelfth International Symposium on Plasma Processing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 98-4
- 発行年:
- 1998
- 開始ページ:
- 66
- 終了ページ:
- 70
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771986 [1566771986]
- 言語:
- 英語
- 請求記号:
- E23400/98-4
- 資料種別:
- 国際会議録
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9
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Modeling of Notching Caused by Aspect Ratio Dependent Charging During High Density Plasma Etching
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