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OXYGEN CLUSTERING IN CZOCHRALSKI SILICON AT LOW TEMPERATURES: ENHANCED DIFFUSION OR SPATIAL CORRELATION?

著者名:
McQuaid, S.A.
Johnson, B.K.
Gambaro, D.
Falster, R.
Ashwin, M.
Newman, R.C.
さらに 1 件
掲載資料名:
Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
98-1(2)
発行年:
1998
開始ページ:
1023
終了ページ:
1032
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771931 [1566771935]
言語:
英語
請求記号:
E23400/98-1
資料種別:
国際会議録

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