Blank Cover Image

INVITED: TUNNEL CURRENT AND WEAROUT PHENOMENA IN SUB-5 nm GATE OXIDES

著者名:
掲載資料名:
Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
98-1(1)
発行年:
1998
開始ページ:
730
終了ページ:
744
総ページ数:
15
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771931 [1566771935]
言語:
英語
請求記号:
E23400/98-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Soft Breakdown Mechanism in Ultrathin Gate Oxides

Mizubayashi, W., Itokawa, H., Miyazaki, S., Hirose, M.

Electrochemical Society
7 国際会議録 1/f Noise in the Tunneling Current of Thin Gate Oxides

Alers, G. B., Monroe, D., Krisch, K. S., Weir, B. E., Chang, A. M.

MRS - Materials Research Society
2 国際会議録 Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity

Imafuku, D., Mizubayashi, W., Miyazaki, S., Hirose, M., Wakayama, Y., Kobayashi, S.

MRS - Materials Research Society
8 国際会議録 CHEMICAL STRUCTURE OF NATIVE OXIDE GROWN ON HYDROGEN-TERMINATED SILICON SURFACES

Takakura, M., Yasaka, T., Miyazaki, S., Hirose, M.

Materials Research Society
3 国際会議録 Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity

Imafuku, D., Mizubayashi, W., Miyazaki, S., Hirose, M., Wakayama, Y., Kobayashi, S.

MRS - Materials Research Society
9 国際会議録 Sub 2 nm Thick Zirconjism Doped Hafnium Oxide High-K Gate Dielectrics

Y. Kuo, J. Lu, J. Yan, T. Yuan, H. Kim, J. Peterson, M. Gardner, S. Chatterjee, W. Luo

Electrochemical Society
4 国際会議録 Self-Assembling Formation of Silicon Quantum Dots by Low Pressure Chemical Vapor Deposition

Nakagawa, K., Fukuda, M., Miyazaki, S., Hirose, M.

MRS - Materials Research Society
10 国際会議録 INFRARED SPECTRA OF ULTRA-THIN SiO2 GROWN ON Si SURFACES

Yamazaki, T., Miyazaki, S., Bjorkman, C. H., Fukuda, M., Hirose, M.

MRS - Materials Research Society
5 国際会議録 High Density Plasma Gate Etching of 0.12 um Devices with Sub-1.5 nm Gate Oxides

Klemens, F.P., Baumann, F.H., Kornblit, A., Layadi, N., Lee, H., Maynard, H.L., Mytych, J.M., Sorch, T.W., Tennant, …

Electrochemical Society
11 国際会議録 CLEANING AND OXIDATION OF HEAVILY DOPED Si SURFACES

Yasaka, T., Uenaga, S., Yasutake, H., Takakura, M., Miyazaki, S., Hirose, M.

Materials Research Society
6 国際会議録 Influence of Various Factors on the COP-Related Gate Oxide Integrity Degradation of Si Wafers

Miyazaki,M., Miyazaki,S., Kitamura,T.

SPIE - The International Society for Optical Engineering
12 国際会議録 High Reliable In Situ Steam Generation Process for 1.5-2.5 nm Gate Oxides

Bidaud, M., Guyader, F., Glowacki, F., Monsieur, F., Ray, D., Bruyere, S., Vincent, E., Barb, K.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12