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Low-Temperature, In Situ, Plasma Activated Wafer Bonding

著者名:
掲載資料名:
Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-36
発行年:
1997
開始ページ:
598
終了ページ:
606
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771894 [1566771897]
言語:
英語
請求記号:
E23400/97-36
資料種別:
国際会議録

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