Blank Cover Image

POST W CMP CLEANING

著者名:
Constant, I.
Marthon, S.
Lardin, T.
David, C.
Jacquemond, M.N.
Tardif, F.
さらに 1 件
掲載資料名:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-35
発行年:
1997
開始ページ:
626
終了ページ:
633
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771887 [1566771889]
言語:
英語
請求記号:
E23400/97-35
資料種別:
国際会議録

類似資料:

1 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES

Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W.

Electrochemical Society
7 国際会議録 NATURAL HYDROCARBON DEPOSITION ON SILICON WAFERS AND REMOVAL AS MEASURED BY IMS

Ollier, E., Marthon, S., Quagliotti, G., Tardif, F.

Electrochemical Society
2 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES

Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W.

Electrochemical Society
8 国際会議録 Post W CMP Cleaning Without HF Cleans

Y. Kang, C. Yang, T. Kwon, J. Park, J. Jo

Electrochemical Society
3 国際会議録 OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE

Tardif, F., Lardin, T., Paillet, C., Joly, J.P., Fleury, A., Patruno, P., Levy, D., Barla, K.

Electrochemical Society
9 国際会議録 Elimination of Post Cu-CMP Watermark by Optimizing Post CMP Clean to Control Cu Dissolution

S. Petitdidier, M. Mellier, C. Trouiller, C. Euvrard, M. Juhel

Electrochemical Society
4 国際会議録 Technique Of Surface Control With The Electrolyzed D.I.water For Post CMP Cleaning

Shirakashi, M., Itoh, K., Katakabe, I., Kamezawa, M., Kihara, S., Tsujimura, M., Saitoh, T., Yamada, K., Miyashita, N., …

Materials Research Society
10 国際会議録 Mechanism of a New Post CMP Cleaning for Trench Isolation Process

Abe, N., Izumi, T., Kodera, M., Mase, Y., Minami, Y., Miyashita, N., Takayasu, J.

Materials Research Society
5 国際会議録 Sensitivity of the surface charge profiler (SCP) method for some monitoring applications

Danel, A., Lardin, T., Kamarinos, G., Tardif, F.

Electrochemical Society
11 国際会議録 Enhancement of Post Copper CMP Cleaning Using CO2 Cryogenic Technology

Banerlee, S., Chung, H.F., Small, R., Shang, C.

Electrochemical Society
6 国際会議録 PROTECTION OF HF BATHS AGAINST NOBEL METAL CONTAMINATION

Kunz, S., Marthon, S., Tardif, F.

Electrochemical Society
12 国際会議録 SILK SURFACE CHEMICAL TREATMENT

Beverina, A., Maisonobe, J. C., Lardin, T., Ermolieff, A., Passemard, G., Tardif, F.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12