A UNIQUE CHEMISTRY TO CLEAN SIDEWALL POLYMERS FORMED BY PLASMA ETCHING OF VIA AND METAL LAYERS OF INTEGRATED CIRCUIT FABRICATION

A UNIQUE CHEMISTRY TO CLEAN SIDEWALL POLYMERS FORMED BY PLASMA ETCHING OF VIA AND METAL LAYERS OF INTEGRATED CIRCUIT FABRICATION

著者名:

Honda, K.

掲載資料名:

Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-35

発行年:

1997

開始ページ:

617

終了ページ:

625

総ページ数:

9

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771887 [1566771889]

言語:

英語

請求記号:

E23400/97-35

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013897
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	5th ; 192th
会議開催地:	Paris, France
会議開催年:	1997.09.00

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