OPTIMIZATION OF ETCHING UNIFORMITY AND REPEATABILITY IN DILUTED HF

OPTIMIZATION OF ETCHING UNIFORMITY AND REPEATABILITY IN DILUTED HF

著者名:

Bellandi, E.

掲載資料名:

Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-35

発行年:

1997

開始ページ:

207

終了ページ:

212

総ページ数:

6

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771887 [1566771889]

言語:

英語

請求記号:

E23400/97-35

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013897
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	5th ; 192th
会議開催地:	Paris, France
会議開催年:	1997.09.00

類似資料:

1 国際会議録 PARTICLE REMOVAL EFFICIENCY OF DILUTED HF SOLUTIONS Alessandri, M., Bellandi, E., Pipia, F., Crivelli, B., Wolke, K., Schenkl, M. Electrochemical Society	7 国際会議録 A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS Vermeulen, W.J.C., Kwakman, L.F.Tz., Werkhoven, C.J., Granneman, E.H.A., Verhaverbeke, S., Heyns, M. Electrochemical Society
2 国際会議録 EFFICIENCY OF OZONE DISSOLUTION INTO AMBIENT TEMPERATURE RINSE BATHS Wolke, K., Schenkl, M., Alessandri, M., Bellandi, E. Electrochemical Society	8 国際会議録 HF CONCENTRATION OF CONTROL IN IC MANUFACTURING Kashkoush, Ismail, Chen, G., Boelen, P., Geomini, M. Electrochemical Society
3 国際会議録 PREVENTION OF Si ETCHING IN DILUTED SC1 SOLUTIONS Bellandi, E., Alessandri, M., Lodi, D., Strada, M., Pipia, S., Petitdidier, S., Levy, D. Electrochemical Society	9 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. SPIE-The International Society for Optical Engineering
4 国際会議録 THE ST CLEAN DUAL STEP CLEANING CONCEPT Bellandi, R., Alessandri, M., Lodi, D., Pipia, F. Electrochemical Society	10 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. Electrochemical Society
5 国際会議録 EFFECT OF WAFER BACKSIDE ON PARTICLE ADDITION BEHAVIOUR OF HF-RCA SEQUENCE Strada, M., Lodi, D., Bellandi, E., Alessandri, M. Electrochemical Society	11 国際会議録 HF IN SITU TANK USED IN HF-LAST CLEAMNG Patruno, P., Levy, D., Fleury, A., Tonti, A., Tardif, F. Electrochemical Society
6 国際会議録 Study of SiO2 Modifications Induced by Oxygen Plasmas and Their Effect on Wet Processes A. Votta, E. Bellandi, M. Alessandri, A. Vedda, A. Ferretti Electrochemical Society	12 国際会議録 Stress Management in IC Manufacturing: μ-Raman Spectroscopy Revisited Kwakman, L.F.T., Delille, D., Mermoux, M., Crisci, A., Lucazeau, G. SPIE-The International Society for Optical Engineering

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