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MINIMIZING SULFUR CONTAMINATION AND RINSE WATER VOLUME REQUIRED FOLLOWING A SULPHURIC ACID/HYDROGEN PEROXIDE CLEAN BY PERFORMING A CHEMICALLY BASIC CLEAN

著者名:
掲載資料名:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-35
発行年:
1997
開始ページ:
23
終了ページ:
30
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771887 [1566771889]
言語:
英語
請求記号:
E23400/97-35
資料種別:
国際会議録

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