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Homoepitaxially Grown Boron-Doped Diamond Thin Film Using Trimethylboron as a Dopant by Microwave Plasma-Assisted Chemical Vapor Deposition

著者名:
Saito, T.
Ohtsubo, K.
Tsuruga, S.
Kameta, M.
Maeda, H.
Kusakabe, K.
Morooka, S.
Kiyota, Hideo
さらに 3 件
掲載資料名:
Proceedings of the Fifth International Symposium on Diamond Materials
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-32
発行年:
1997
開始ページ:
88
終了ページ:
95
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771856 [1566771854]
言語:
英語
請求記号:
E23400/97-32
資料種別:
国際会議録

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