Selective Epitaxial Growth of SiGe Films in LPCVD Reactor Systems- Characterization of SiGe Films by Ellipsometry
- 著者名:
Lee, I.M. Wang, W.C. Koh, M.T.K. Denton, J.P. Takoudis, C.G. Kram, E.P. Neudeck, G.W. - 掲載資料名:
- Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-25
- 発行年:
- 1997
- 開始ページ:
- 1348
- 終了ページ:
- 1355
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771788 [1566771781]
- 言語:
- 英語
- 請求記号:
- E23400/97-25
- 資料種別:
- 国際会議録
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