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Restructuration-Doping Process Near the Poly Si/SiO2 Interface on Silicon During the Phosporus Diffusion

著者名:
Gaiseanu, F.
Dimitriadis, C.A.
Stoemenos, J.
Postolache, C.
Tsoukalas, D.
Kruger, D.
Tsoi, E.
さらに 2 件
掲載資料名:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-25
発行年:
1997
開始ページ:
1289
終了ページ:
1296
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
言語:
英語
請求記号:
E23400/97-25
資料種別:
国際会議録

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