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Surface Roughness Evaluation of CVD Doped Oxide Films for Advanced Deep Sub-Micron Semiconductor Applications

著者名:
Ilg, M.
Ploessl, R.
Stuber, J.
Conti, R.
Cote, D.
Gambino, J.
Tobben, D.
Kirchoff, M.
さらに 3 件
掲載資料名:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-25
発行年:
1997
開始ページ:
749
終了ページ:
755
総ページ数:
7
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
言語:
英語
請求記号:
E23400/97-25
資料種別:
国際会議録

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