In-Situ Oxygen Plasma Enhancement for Coherent Ti/TiN Barrier Metal Application
- 著者名:
Lee, K.-B. Kwak, N.-J. Kim, S.-D. Kim, C.-T. Fu, J. Nahm, M.K. Diaz, R. Lai, C.S. Xu, Z. Han, B.B. Park, J.-G. Jang, W. - 掲載資料名:
- Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-9
- 発行年:
- 1997
- 開始ページ:
- 333
- 終了ページ:
- 338
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771368 [1566771366]
- 言語:
- 英語
- 請求記号:
- E23400/97-9
- 資料種別:
- 国際会議録
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