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Simulation of Plasma Etch Process Control on Etching Time-Scales: Multi-Coil Control of an Inductively Coupled Plasma Source

著者名:
Yang, J.
Yamada, N.
Ventzek, P.L.G.
Sakai, Y.
Date, H.
Tagashira, H.
Kitamori, K.
さらに 2 件
掲載資料名:
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-9
発行年:
1997
開始ページ:
233
終了ページ:
244
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771368 [1566771366]
言語:
英語
請求記号:
E23400/97-9
資料種別:
国際会議録

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