Plasma Etch Process Control with a Neural Network-Based Prediction Model

Plasma Etch Process Control with a Neural Network-Based Prediction Model

著者名:

掲載資料名:

Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-9

発行年:

1997

開始ページ:

19

終了ページ:

27

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771368 [1566771366]

言語:

英語

請求記号:

E23400/97-9

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013880
シリーズID:	PA00000028
会議名:	International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing ; Meeting of the Electrochemical Society
回次:	2nd ; 191st
会議開催地:	Montreal, Quebec, Canada
会議開催年:	1997.05.04-1997.05.11

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