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SiOF Film Deposition Using FTES Gas In Helicon Wave Plasmas

著者名:
掲載資料名:
Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-8
発行年:
1997
開始ページ:
20
終了ページ:
31
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771351 [1566771358]
言語:
英語
請求記号:
E23400/97-8
資料種別:
国際会議録

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