Composition and Mechanical Properties of Sill-con Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma-Enhanced Chemi-cal Vapor Deposition Technique

Composition and Mechanical Properties of Sill-con Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma-Enhanced Chemi-cal Vapor Deposition Technique

著者名:

掲載資料名:

Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-10

発行年:

1997

開始ページ:

552

終了ページ:

564

総ページ数:

13

出版情報:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771375 [1566771374]

言語:

英語

請求記号:

E23400/97-10

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013870
シリーズID:	PA00000028
会議名:	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
回次:	4th
会議開催地:	Montreal, QC, Canada
会議開催年:	1997.05.04-1997.05.09

類似資料:

1 国際会議録 Effect of Aging on Stress in Silicon Nitride Films by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition Technique. Sah, R.E., Baumann, H., Serries, D., Kiefer, R., Braunstein, J. Electrochemical Society	7 国際会議録 A Study on the Behavior of Water Absorption of SiOF Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Method Kim, S.P., Choi, S.K., Park, Youngsoo, Chung, Ilsub Materials Research Society
2 国際会議録 Wet Etching Studies on Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Films Sundaram, K.B., Sah, R.E., Balachandran, K. Electrochemical Society	8 国際会議録 Composition Dependence of Room-Temperature 1.54-ｦﾌm Er3+ Luminescence From Erbium-Doped silicon:Oxygen Thin Films Deposited by Electron Cyclotron Resonance … Shin, Jung H., Kim, Mun-Jun, Seo, Se-Young, Lee, Choochon MRS - Materials Research Society
3 国際会議録 Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition T. Roschuk, J. Wojcik, R Mascher Society of Vacuum Coaters	9 国際会議録 Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications Panepucci,R.R., Diniz,J.A., Carli,E., Tatschi,P.J., Swart,J.W. SPIE-The International Society for Optical Engineering
4 国際会議録 Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L. Electrochemical Society	10 国際会議録 Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron-Resonance Plasma Enhanced Chemical Vapor Deposition Theil, Jeremy A., Mertz, Francoise, Yairi, Micah, Seaward, Karen, Ray, Gary, Kooi, Gerrit MRS - Materials Research Society
5 国際会議録 Low-Temperature Plasma Deposition of Passivating Layers with Low Hydrogen Content for Optoelectronic Devices Sah, R.E., Baumann, H. Electrochemical Society	11 国際会議録 Using Electron Cyclotron Resonance Plasma for Depositing Epitaxial Titanium Nitride Thin Films Murzin, I. H., Hayashi, N., Sakamoto, I. MRS - Materials Research Society
6 国際会議録 RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition Hirano,Y., Sato,F., Jayatissa,A.H., Ohtake,H., Takizawa,K. SPIE-The International Society for Optical Engineering	12 国際会議録 ECR-Plasma Deposited Oxygen-Free SiNx Films for Low and High Reflectivity Coatings for GaAs Based Devices Sah, R.E., Weimar, W., Baumann, H., Wagner, J., Kiefer, R., Muller, S. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12