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Ultrathin MOS Gate Insulators: Surface Prepa-ration, Growth, and Interface Control

著者名:
Nishioka, Y.
Komeda, T.
Namba, K.
Matsumura, M.
Sakoda, T.
Kubota, T.
Yamashita, Y.
Kobayashi, H.
さらに 3 件
掲載資料名:
Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-10
発行年:
1997
開始ページ:
347
終了ページ:
362
総ページ数:
16
出版情報:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771375 [1566771374]
言語:
英語
請求記号:
E23400/97-10
資料種別:
国際会議録

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