Surface Roughness of Silicon Diaphragm Due to Ionic Contamination During Electrochemical Etching of Silicon

Surface Roughness of Silicon Diaphragm Due to Ionic Contamination During Electrochemical Etching of Silicon

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Microstructures and Microfabricated Systems

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-5

発行年:

1997

開始ページ:

64

終了ページ:

71

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771320 [1566771323]

言語:

英語

請求記号:

E23400/970514

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013866
シリーズID:	PA00000028
会議名:	International Symposium on Microstructures and Microfabricated Systems ; Meeting of the Electrochemical Society
回次:	3rd ; 191st
会議開催地:	Montreal, Canada
会議開催年:	1997.05.04-1997.05.09

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