Blank Cover Image

Ultrathin Oxide Technology

著者名:
掲載資料名:
ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-3
発行年:
1997
開始ページ:
235
終了ページ:
246
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771306 [1566771307]
言語:
英語
請求記号:
E23400/970512
資料種別:
国際会議録

類似資料:

1 国際会議録 Ultrashallow Junctions and Salicide Technology for Advanced CMOS Devices

Ohguro, T., Nakamura, S., Saito, M., Ono, S., Harakawa, H., Morifuji, E., Yoshitomi, T., Morimoto, T., Momose, H.S., …

Electrochemical Society
7 国際会議録 Si Channel Surface Dependence of Electrical Characteristics in Ultra-Thin Gate Oxide CMOS*

Momose, H.S.

Electrochemical Society
2 国際会議録 Advanced rf CMOS technology

Iwai,H., Ohguro,T., Morifuji,E., Yoshitomi,T., Kimijima,H., Momose,H.S., Inoh,K., Nii,H., Katsumata,Y.

SPIE - The International Society for Optical Engineering
8 国際会議録 Ultra-Thin Gate SiO2 Technology

Iwal, H., Momose, H.S., Ohrni, S.-I.

Electrochemical Society
3 国際会議録 Advanced rf CMOS technology

Iwai,H., Ohguro,T., Morifuji,E., Yoshitomi,T., Kimijima,H., Momose,H.S., Inoh,K., Nii,H., Katsumata,Y.

SPIE - The International Society for Optical Engineering
9 国際会議録 Diagnostics of Metalorganic Chemical Vapor Deposition of (Ba, Sr)TiO3 Films by Microdischarge Optical Emission Spectroscopy

Momose, S., Nakamura, T., Tachibana, K.

Electrochemical Society
4 国際会議録 Advanced rf CMOS technology

Iwai,H., Ohguro,T., Morifuji,E., Yoshitomi,T., Kimijima,H., Momose,H.S., Inoh,K., Nii,H., Katsumata,Y.

SPIE - The International Society for Optical Engineering
10 国際会議録 A study of the limited area scanning system in the mask CD-SEM

T. Iwai, S. Shida, M. Hiroyama, T. Nakamura, H. Sakaguchi

Society of Photo-optical Instrumentation Engineers
5 国際会議録 Advanced rf CMOS technology

Iwai,H., Ohguro,T., Morifuji,E., Yoshitomi,T., Kimijima,H., Momose,H.S., Inoh,K., Nii,H., Katsumata,Y.

SPIE - The International Society for Optical Engineering
11 国際会議録 36 Ultrathin plasma nitrided oxide gate dielectrics for sub-100 nm generation CMOS technology

Jioon, J., Yeh, P., En, B., Wieczorek, K., Graetscl, F, Bernard, J., Kim, H.S., Ihok, F., Olsen, C., Zhao, R., Ogle, B.

Electrochemical Society
6 国際会議録 Silicon Epitaxy and Its Application to RF ICs

Ohguro, T., Naruse, H., Sugaya, H., Nakamura, S., Sugiyama, N., Morifuji, E., Kimijima, H., Yoshitomi, T., Morimoto, T., …

Electrochemical Society
12 国際会議録 Infrared Spectroscopic Study on Metalorganic Chemical Vapor Deposition of (Ba, Sr)TiO3 Films

Nakamura, T., Nishimura, T., Momose, S., Tachibana, K.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12