6 Cleaning Technology in Semiconductor Device Manufacturing: Approaches to Environmentally Responsible Processing

6 Cleaning Technology in Semiconductor Device Manufacturing: Approaches to Environmentally Responsible Processing

著者名:

掲載資料名:

Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-21

発行年:

1996

開始ページ:

68

終了ページ:

82

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771719 [1566771714]

言語:

英語

請求記号:

E23400/970283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013854
シリーズID:	PA00000028
会議名:	Symposium on Environmental Aspects of Electrochemical Technology ; Meeting of the Electrochemical Society
回次:	1996 ; 190th
会議開催地:	San Antonio, TX, USA
会議開催年:	1996.10.07-1996.10.08

類似資料:

1 国際会議録 DETECTION OF PROCESS INDUCED DISLOCATIONS IN SILICON Benton, J.L., Higashi, G.S., Boone, T. Electrochemical Society	7 国際会議録 Influence of oxygen precipitates on the measurement of minority carrier diffusion length in p-type silicon material using surface photovoltage technique Ma,Y., Lee,J.L., Benton,J.L., Boone,T., Eaglesham,D.J., Higashi,G.S. SPIE-The International Society for Optical Engineering
2 国際会議録 Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES Liu, J.Q., Lee, C., Rosamilia, J.M., Boone, T., Higashi, G.S. Electrochemical Society	8 国際会議録 ION IMPLANTED CALIBRATION STANDARDS FOR Si SURFACE CONTAMINATION DETECTION BY TXRF Jacobson, D. C., Poate, J. M., Higashi, G. S., Boone, T., Eaglesham, D. J., Hockett, Richard MRS - Materials Research Society
3 国際会議録 CHEMICAL VAPOR CLEANING TECHNOLOGiES FOR DRY PROCESSING IN SEMICONDUCTOR MANUFACTURING Beck, S.E., Bohling, D.A., Felker, B.S., George, M.A., Gilicinski, A.G., Ivankovits, J.V., Langan, J.G., Rynders, S.W., … Electrochemical Society	9 国際会議録 Laser cleaning technology of the contact hole for semiconductor manufacturing Kim, D.-J., Kim, H.-J., Ryu, J.-K., Pak, S.-S. SPIE - The International Society of Optical Engineering
4 国際会議録 AFM Characterization of Semiconductor Materials and Devices Hanson, K.J., Sapjeta, J., Higashi, G.S. Electrochemical Society	10 国際会議録 Infusion Processing: An Alternative to Plasma Technology for Semiconductor Device Manufacturing (Invited paper) Hautala, J., Skinner, W., Sherman, S., Shao, Y., Borland, J. Electrochemical Society
5 国際会議録 The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning Higashi, G.S., Chabal, Y.J., Raghavachari, K., Becker, R.S., Green, M.P., Hanson, K., Boone, T., Eisenberg, J.H., Shive, … Electrochemical Society	11 国際会議録 Laser chemical process for clean applications of semiconductor manufacturing Yogev,D., Engel,M.Y., Zeid,S., Barzilay,I., Livshits,B. SPIE - The International Society for Optical Engineering
6 国際会議録 Hot Water Etching of Silicon Surfaces: New Insights of Mechanistic Understanding and Implications to Device Fabrication Rosamilia, J. M., Boone, T., Sapjeta, J., Raghavachari, K., Higashi, G. S., Liu, Q. MRS - Materials Research Society	12 国際会議録 THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS Chang, J.P., Sapjeta, J., Rosamilia, J.M., Boone, T., Eng, J., Jr., Opila, R.L., Brennan, S., Wiemer, C., Pianetta, P. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12