Effect of Dry Etching in III-Nitride Surface Properties

Effect of Dry Etching in III-Nitride Surface Properties

著者名:

Ren, F.

掲載資料名:

Proceedings of the Symposium on High Speed III-V Electronics for Wireless Applications and the twenty-fifth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXV)

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-15

発行年:

1996

開始ページ:

289

終了ページ:

297

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771658 [156677165X]

言語:

英語

請求記号:

E23400/963435

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013848
シリーズID:	PA00000028
会議名:	Symposium on High Speed III-V Electronics for Wireless Applications ; State-of-the-Art Program on Compound Semiconductors - SOTAPOCS ; Meeting of the Electrochemical Society
回次:	1996 ; 25th ; 190th
会議開催地:	San Antonio, Texas, USA
会議開催年:	1996.10.06-1996.10.11

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2 国際会議録 The Role of Plasma Chemistry and Ion Density in Dry Etching of Nitrides Vartuli, C.B., Pearton, S.J., Abernathy, C.R., Shul, R.J., Ren, F. Electrochemical Society	8 国際会議録 Plasma Chemistries for Dry Etching GaN, AlN, InGaN and InAlN Pearton, S. J., Vartuli, C. B., Lee, J. W., Donovan, S. M., MacKenzie, J. D., Abernathy, C. R., Shul, R. J., McLane, G. … MRS - Materials Research Society
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6 国際会議録 REDUCTION OF SIDEWALL ROUGHNESS DURING DRY ETCHING OF SiO2 Ren, F., Pearton, S.J., Lothian, J.R., Abernathy, C.R., Hobson, W.S. Materials Research Society	12 国際会議録 Rapid Thermal Processing of III-Nitrides Hong, J., Lee, J. W., Vartuli, C. B., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Crockett, R. V., Pearton, S. … MRS - Materials Research Society

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