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Application of Thermal Shields in the Floating Zone (FZ) Growth of Silicon

著者名:
Ludge, A.
Schilling, H.
Rieman, H.
Rost, H.-J.
Boettcher, K.
Schleusener, B.
Hensel, W.
さらに 2 件
掲載資料名:
Proceedings of the Fourth International Symposium on High Purity Silicon
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-13
発行年:
1996
開始ページ:
41
終了ページ:
48
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771566 [1566771560]
言語:
英語
請求記号:
E23400/963433
資料種別:
国際会議録

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