Real-Time Control of PECVD Silicon Nitride Film Properties
- 著者名:
- 掲載資料名:
- Proceedings of the eleventh International Symposium on Plasma Processing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 96-12
- 発行年:
- 1996
- 開始ページ:
- 688
- 終了ページ:
- 699
- 総ページ数:
- 12
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771641 [1566771641]
- 言語:
- 英語
- 請求記号:
- E23400/962354
- 資料種別:
- 国際会議録
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Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature
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Erbium doped silicon rich silicon oxide luminescent thin films deposited by ECR-PECVD [5970-118]
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