On End Point Detection of Plasma Etching via Optical Emission Interferometry

On End Point Detection of Plasma Etching via Optical Emission Interferometry

著者名:

掲載資料名:

Proceedings of the eleventh International Symposium on Plasma Processing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-12

発行年:

1996

開始ページ:

210

終了ページ:

221

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771641 [1566771641]

言語:

英語

請求記号:

E23400/962354

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013845
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Meeting of the Electrochemical Society
回次:	11th ; 189th
会議開催地:	Los Angels, CA, USA
会議開催年:	1996.05.05-1996.05.10

類似資料:

1 国際会議録 Wafer Edge and Interferometry Limitations in Low Open Area Etch Endpoint Detection using Optical Emission Spectroscopy Goodlin, B.E., Boning, D.S., Sawin, H.H., Yang, M. Electrochemical Society	7 国際会議録 Feature Profile Evolution during the High Density Plasma Etching of Patterned Polysilicon Mahorowala, A.P., Sawin, H.H. Electrochemical Society
2 国際会議録 Run-to-Run Process Control on a Dual-Coil Transformer Coupled Plasma Etcher with Full Wafer Interferometry and Spatially Resolved Optical Emission Spectroscopy Le, M.S., Smith, T.H., Boning, D.S., Sawin, H.H. Electrochemical Society	8 国際会議録 PARAMETRIC CHARACTERIZATION OF PLASMA ETCHING PROCESSES Mocella, M. T., Jenkins, M. W., Sawin, H. H., Allen, K. D. Materials Research Society
3 国際会議録 Simultaneous Fault Detection and Classification for Semiconductor Manufacturing Tools Goodlin, B.E., Boning, D.S., Sawin, H.H, Wise, B.M Electrochemical Society	9 国際会議録 Deep Reactive Ion Etching of Silicon Ayon, A.A., Chen, K-S., Lohner, K.A., Spearing, S.M., Sawin, H.H., Schmidt, M.A. Materials Research Society
4 国際会議録 OPTICAL EMISSION END-POINT DETECTION FOR VIA HOLE ETCHING IN InP AND GaAs POWER DEVICE STRUCTURES Pearton, S. J., Ren, F., Abernathy, C. R., Constantine, C. MRS - Materials Research Society	10 国際会議録 Etching vs Deposition: The Effect on Profiles and Etching Yield Curves for Oxide Etching Kwon, O., Jin, W., Sawin, H.H. Electrochemical Society
5 国際会議録 Quantitative Analysis and Comparison of Endpoint Detection Based on Multiple Wavelength Analysis - Part II: Noise Analysis of Multi-Wavelength OES Goodlin, B.S., Boning, D.S., Sawin, H.H. Electrochemical Society	11 国際会議録 Profile Evolution Simulation of High Density Plasma Etching of Patterned Polysilicon Mahorowala, A.P., Chang, J.P., Sawin, H.H. Electrochemical Society
6 国際会議録 Plasma-Surface Kinetics and Feature Profile Evolution in Cl2 + HBr Etching of Poly-silicon Jin, W., Vitale, S.A., Sawin, H.H. Electrochemical Society	12 国際会議録 On In-Situ Etch Rate Extraction from Interferometric Signals Wong, K.S., Boning, D.S. Electrochemical Society

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