A High Density, Pulsed RF Inductively Coupled Reactor for Sub- Half Micron Etch Applications
- 著者名:
Ditizio, R.A. Jerde, L.G. Zhang, Y. Meyer, J.A. Zucker, M.L. Mantei, T. - 掲載資料名:
- Proceedings of the eleventh International Symposium on Plasma Processing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 96-12
- 発行年:
- 1996
- 開始ページ:
- 89
- 終了ページ:
- 95
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771641 [1566771641]
- 言語:
- 英語
- 請求記号:
- E23400/962354
- 資料種別:
- 国際会議録
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