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Kinetics Investigation of Remote Plasma-Enhanced Chemical Vapor Deposition of SiO2

著者名:
掲載資料名:
Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-5
発行年:
1996
開始ページ:
177
終了ページ:
182
総ページ数:
6
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771559 [1566771552]
言語:
英語
請求記号:
E23400/962104
資料種別:
国際会議録

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