Interdiffusion Mechanisms in Coherently Strained SiGe Multilayers
- 著者名:
Cowern, N.E.B. Kersten, W.J. Kruif, R.C.M. van Berkum, J.G.M. de Boer, W.B. Gravesteijn, D.J. Bulle-Liewma, C.W.T. - 掲載資料名:
- Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 96-4
- 発行年:
- 1996
- 開始ページ:
- 195
- 終了ページ:
- 209
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771542 [1566771544]
- 言語:
- 英語
- 請求記号:
- E23400/961823
- 資料種別:
- 国際会議録
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6
国際会議録
Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
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