Electrical Characterization of Highly Reliable 80Å Oxide

Electrical Characterization of Highly Reliable 80Å Oxide

著者名:

掲載資料名:

The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-1

発行年:

1996

開始ページ:

645

終了ページ:

656

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771511 [156677151X]

言語:

英語

請求記号:

E23400/962115

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013835
シリーズID:	PA00000028
会議名:	International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface
回次:	3rd
会議開催地:	Los Angeles, CA, USA
会議開催年:	1996.05.05-1996.05.10

類似資料:

1 国際会議録 Characterization of nitrided silicon-silicon dioxide interfaces Polignano, M. L., Alessandri, M., Brazzelli, D., Crivelli, B., Ghidini, G., Zonca, R., Caricato, A. P., Bersani, M., … MRS-Materials Research Society	7 国際会議録 Novel LOCOS isolation process for producing highly reliable oxides Gardner,M.I., Kadoch,D. SPIE-The International Society for Optical Engineering
2 国際会議録 Physical-Chemical Evolution of Hf-Aluminates Upon Thermal Treatments Crivelli, B., Alessandri, M., Alberici, S., Brazzelli, D., Elbaz, A. C., Frabboni, S., Ghidini, G., Maes, J. W., … Materials Research Society	8 国際会議録 Highly reliable oxide VCSELs for datacom applications (Invited Paper) Aeby, I., Collins, D., Gibson, B., Helms, C.J., Hou, H.Q., Lou, W., Bossert, D.J., Wang, C.X. SPIE-The International Society for Optical Engineering
3 国際会議録 A New Methodology for a Statistical Evaluation of SILC: Characterization of Stress Conditions and Oxide Technology Ghidini, G., Rigamonti, M., Brazelli, D., Pellizzer, F., Martinelli, A., Galbiati, N. Electrochemical Society	9 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K. Electrochemical Society
4 国際会議録 High Performance, Highly Reliable Gate Oxide Formed with Rapid Thermal Oxidation In-Situ Steam Generation (ISSG) Technique Ma, Y., Chen, Y.N., Brown, M.M, Li, F., Chen, Y., Eng, J., Jr., Opila, R.L., Chabal, Y.J., Sapjeta, J., Muller, D.A., … Electrochemical Society	10 国際会議録 NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES Heyns, M. M., Verhaverbeke, S., Meuris, M., Mertens, P. W., Schmidt, H., Kubota, M., Philipossian, A., Dillenbeck, K., … MRS - Materials Research Society
5 国際会議録 Detection of metal segregation at the oxide-silicon interface Polignano, M.L., Giussani, A., Caputo, D., Clementi, C., Pavia, G., Priolo, F. Electrochemical Society	11 国際会議録 Low-cost and highly reliable optoelectronic devices for 10-Gb/s ethernet applications Tsai, C. -H., Lee, S. -G., Chen, C. -K., Hsu, C. -H., Lee, C. -S., Shen, K. -Y., Cheng, S. -C., Lee, C. -H., Cheng, F. … SPIE - The International Society of Optical Engineering
6 国際会議録 High-k Materials in Flash Memories M. Alessandri, R. Piagge, S. Alberici, E. Bellandi, M. Caniatti, G. Ghidini, A. Modelli, G. Pavia, E. Ravizza, A. … Electrochemical Society	12 国際会議録 New Horizons for Computational Chemistry: Global Simulation Approach Clementi, E., Lie, G. C. American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12