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DEVELOPMENT OF ADVANCED CORROSION FREE ORGANIC STRIPPERS FOR ULSI PROCESSING

著者名:
Rotondaro, A.L.P.
Honda, K.
Maw, T.
Perry, D.
Lux, M.
Heyns, M.M.
Claeys, C.
Darakchiev, I.
さらに 3 件
掲載資料名:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-20
発行年:
1995
開始ページ:
537
終了ページ:
543
総ページ数:
7
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771153 [1566771153]
言語:
英語
請求記号:
E23400/962140
資料種別:
国際会議録

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1 国際会議録 A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING

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7 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

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2 国際会議録 THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES

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8 国際会議録 DRY PROCESS FOR THE DEFINITION OF SUB 0.lμm W/TiN GATES

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3 国際会議録 Outplating of Metallic Contaminants on Silicon Wafers from Diluted Acid Solutions

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4 国際会議録 The potential and restrictions of the double derivative method for threshold voltage extraction in SOI MOSFET's

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11 国際会議録 SURFACE COMPLEXATION OF METALS: A PREDICTIVE MODEL BASED ON METAL COORDINATION CHEMISTRY -

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