Blank Cover Image

CHEMICAL OXIDE CHARACTERIZATION

著者名:
Paillet, C.
Joly, J.P.
Tardif, F.
Barla, K.
Patruno, P.
Levy, D.
さらに 1 件
掲載資料名:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-20
発行年:
1995
開始ページ:
366
終了ページ:
370
総ページ数:
5
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771153 [1566771153]
言語:
英語
請求記号:
E23400/962140
資料種別:
国際会議録

類似資料:

1 国際会議録 PARTICLE IMPACT ON 7 nm GATE OXIDES

Paillet, C., Papon, A.M., Joly, J.P., Tardif, F., Levy, D., Barla, K., Patruno, P.

Electrochemical Society
7 国際会議録 Monitoring of metallic contamination by direct and indirect analytical methods: application to cleaning processes in IC manufacturing

Tardif, F., Joly, J.P., Walz, D.

Electrochemical Society
2 国際会議録 OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE

Tardif, F., Lardin, T., Paillet, C., Joly, J.P., Fleury, A., Patruno, P., Levy, D., Barla, K.

Electrochemical Society
8 国際会議録 SCA and SPV in line monitoring

Barla,K., Levy,D., Fleury,A., Reynard,J.P., Kwakman,L.

SPIE-The International Society for Optical Engineering
3 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES

Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W.

Electrochemical Society
9 国際会議録 THE CONTROL OF DISSOLVED GASES IN AQUEOUS-BASED SEMICONDUCTOR PROCESSING

Levy, D., Tardif, F., Maunier, F., Pizzetti, C., Christenson, K.

Electrochemical Society
4 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES

Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W.

Electrochemical Society
10 国際会議録 Silicon Surface Chemical Treatments In Oxide/ Nitride Dielectric Stack Properties

Jacques, D., Petitdidier, S., Regolini, J.L., Barla, K.

Materials Research Society
5 国際会議録 HF IN SITU TANK USED IN HF-LAST CLEAMNG

Patruno, P., Levy, D., Fleury, A., Tonti, A., Tardif, F.

Electrochemical Society
11 国際会議録 HF Last Cleaning Before Silicon Epitaxy

Patruno, P., Fleury, A., Wyborn, H., Andre, E., Tardif, F.

Electrochemical Society
6 国際会議録 Comparative study of on-line lifetime techniques for the monitoring of metallic micro contamination for ULSI microelectronics

Walz, D., Joly, J.P., Kamarinos, G., Barla, K.

Electrochemical Society
12 国際会議録 SPECTROSCOPIC AND ELECTROCHEMICAL STUDIES OF THE GROWTH OF CHEMICAL OXIDE IN SC1 AND SC2

Petitdidier, S., Guyader, F., Barla, K., Rouchon, D., Rochat, N., Erre, R., Bertagna, V.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12