OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE

OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE

著者名:

Tardif, F.

掲載資料名:

Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-20

発行年:

1995

開始ページ:

49

終了ページ:

59

総ページ数:

11

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771153 [1566771153]

言語:

英語

請求記号:

E23400/962140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013825
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Electrochemical Society Meeting
回次:	4th
会議開催地:	Chicago, Illinois, USA
会議開催年:	1995.10.00

類似資料:

1 国際会議録 PARTICLE IMPACT ON 7 nm GATE OXIDES Paillet, C., Papon, A.M., Joly, J.P., Tardif, F., Levy, D., Barla, K., Patruno, P. Electrochemical Society	7 国際会議録 Monitoring of metallic contamination by direct and indirect analytical methods: application to cleaning processes in IC manufacturing Tardif, F., Joly, J.P., Walz, D. Electrochemical Society
2 国際会議録 CHEMICAL OXIDE CHARACTERIZATION Paillet, C., Joly, J.P., Tardif, F., Barla, K., Patruno, P., Levy, D. Electrochemical Society	8 国際会議録 SCA and SPV in line monitoring Barla,K., Levy,D., Fleury,A., Reynard,J.P., Kwakman,L. SPIE-The International Society for Optical Engineering
3 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W. Electrochemical Society	9 国際会議録 POST W CMP CLEANING Constant, I., Marthon, S., Lardin, T., David, C., Jacquemond, M.N., Tardif, F. Electrochemical Society
4 国際会議録 IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES Tardif, F., Joly, J.P., Lardin, T., Tonti, A., Patruno, P., Levy, D., Sievert, W. Electrochemical Society	10 国際会議録 Comparative study of on-line lifetime techniques for the monitoring of metallic micro contamination for ULSI microelectronics Walz, D., Joly, J.P., Kamarinos, G., Barla, K. Electrochemical Society
5 国際会議録 HF IN SITU TANK USED IN HF-LAST CLEAMNG Patruno, P., Levy, D., Fleury, A., Tonti, A., Tardif, F. Electrochemical Society	11 国際会議録 EVALUATION OF ADVANCED PRE-GATE CLEANINGS Cowache, C., Boelen, P., Kashkoush, I., Besson, P., Tardif, F. Electrochemical Society
6 国際会議録 HF Last Cleaning Before Silicon Epitaxy Patruno, P., Fleury, A., Wyborn, H., Andre, E., Tardif, F. Electrochemical Society	12 国際会議録 COMPARISON OF VAPOR-PHASE AND WET CHEMICAL PRE-GATE OXIDE AND PRE-CONTACT CLEANS Draper, C.W., Anyanwu, V.E., Eisenberg, J.H., Felton, G.J., Roy, P.K., Chittipeddi, S., Bechtold, P.F., Hagner, G., … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12