Use of Intrawafer Photoluminescence and Chip Test Mapping to Determine the Effect of Mesa Width on Performance

Use of Intrawafer Photoluminescence and Chip Test Mapping to Determine the Effect of Mesa Width on Performance

著者名:

掲載資料名:

Proceedings of the Symposium on Nondestructive Wafer Characterization for Compound Semiconductor Materials and the twenty-second State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXII)

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-6

発行年:

1995

開始ページ:

84

終了ページ:

90

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771009 [1566771005]

言語:

英語

請求記号:

E23400/952066

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013812
シリーズID:	PA00000028
会議名:	Symposium on Nondestructive Wafer Characterization for Compound Semiconductor Materials ; State-of-the-Art Program on Compound Semiconductors - SOTAPOCS
回次:	1995 ; 22nd
会議開催地:	Reno, Nevada, USA
会議開催年:	1995.05.21-1995.05.26

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