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Production of High Density Plasma on the Substrate in a Helicon Source and application to the Deposition of SiOF Film with Low Dielectric Constant

著者名:
Kim, J-H.
Seo, S-H.
Yun, S-M.
Chang, H-Y.
Choi, C-K.
Lee, K-M.
さらに 1 件
掲載資料名:
Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-2
発行年:
1995
開始ページ:
461
終了ページ:
473
総ページ数:
13
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770965 [1566770963]
言語:
英語
請求記号:
E23400/952062
資料種別:
国際会議録

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