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Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in an Electron Cyclotron Resonance SF6/Ar Discharge

著者名:
掲載資料名:
Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-2
発行年:
1995
開始ページ:
339
終了ページ:
349
総ページ数:
11
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770965 [1566770963]
言語:
英語
請求記号:
E23400/952062
資料種別:
国際会議録

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