Ultraviolet femtosecond and nanosecond laser ablation of silicon: ablation efficiency and laser-induced plasma expansion

Ultraviolet femtosecond and nanosecond laser ablation of silicon: ablation efficiency and laser-induced plasma expansion

著者名:

Zeng, X.J. ( Lawrence Berkeley National Lab. (USA) and University of California/Berkeley (USA) )
Mao, X. ( Lawrence Berkeley National Lab. (USA) )
Greif, R. ( Univ. of California/Berkeley (USA) )
Russo, R.E. ( Lawrence Berkeley National Lab. (USA) )

掲載資料名:

High-Power Laser Ablation V

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5448

発行年:

2004

開始ページ:

1150

終了ページ:

1158

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453716 [0819453714]

言語:

英語

請求記号:

P63600/5448.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013801
シリーズID:	PA00000029
会議名:	High-Power Laser Ablation
回次:	2004 : 5th
会議開催地:	Taos, NM, USA
会議開催年:	2004.04.25-2004.04.30

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