Application of atomic force microscope to 65-nm node photomasks

Application of atomic force microscope to 65-nm node photomasks

著者名:

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itou, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Matsuyama, K. ( Nihon Veeco K.K. (Japan) )
Dawson, D.J. ( Veeco Metrology Group (USA) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5446

発行年:

2004

開始ページ:

751

終了ページ:

758

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

言語:

英語

請求記号:

P63600/5446.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013799
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2004 : 11th
会議開催地:	Yokohama, Japan
会議開催年:	2004.04.14-2004.04.16

類似資料:

1 国際会議録 Advanced photomask repair technology for 65-nm lithography (1) Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Tashiro, J., Suzuki, K., … SPIE - The International Society of Optical Engineering	7 国際会議録 Photomask applications of traceable atomic force microscope dimensional metrology at NIST R. Dixson, N. G. Orji, J. Potzick, J. Fu, R. A. Allen Society of Photo-optical Instrumentation Engineers
2 国際会議録 Advanced photomask repair technology for 65-nm lithography: II Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering	8 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering
3 国際会議録 Shot number analysis at 65-nm node mask writing using VSB writer Hirumi, J., Kuriyama, K., Yoshioka, N., Yoshikawa, R., Hojo, Y., Matuzaka, T., Tanaka, K., Hoga, M. SPIE-The International Society for Optical Engineering	9 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering
4 国際会議録 Advanced photomask repair technology for 65nm lithography (3) [5853-89] Itou, Y., Tanaka, Y., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., Suzuki, K., … SPIE - The International Society of Optical Engineering	10 国際会議録 Advanced photomask repair technology for 65 nm lithography (4) [5992-170] Itou, Y., Tanaka, Y., Suga, O., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering
5 国際会議録 Photomask quality assessment solution for 90-nm technology node Ohira, K., Chung, D.H.P., Nobuyuki, Y., Tateno, M., Matsumura, K., Chen, J.-H., Luk-Pat, G.T., Fukui, N., Tanaka, Y. SPIE - The International Society of Optical Engineering	11 国際会議録 Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era Chung, D. -H., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M. SPIE - The International Society of Optical Engineering
6 国際会議録 Optical mask inspection strategy for 65-nm node and beyond Chung, D.-H.P., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M. SPIE - The International Society of Optical Engineering	12 国際会議録 Critical failure ORC: application to the 90-nm and 65-nm nodes Belledent, J., Shang, S.D., Trouiller, Y., Miramond, C., Patterson, K., Toublan, O.R., Couderc, C., Sundermann, F., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12