Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system
- 著者名:
Jang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Yang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Ahn, B.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5446
- 発行年:
- 2004
- 開始ページ:
- 669
- 終了ページ:
- 674
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- 言語:
- 英語
- 請求記号:
- P63600/5446.2
- 資料種別:
- 国際会議録
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Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
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Proximity effect correction optimization considering fogging and loading effects compensation
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