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Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

著者名:
Chou, S.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shiu, L.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chang, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
さらに 3 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
508
終了ページ:
515
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.2
資料種別:
国際会議録

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