Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks
- 著者名:
- Robinson, T.E. ( FEI Co. (USA) )
- Graupera, A. ( FEI Co. (USA) )
- Morrison, T.B. ( FEI Co. (USA) )
- Ramstein, M. ( Advanced Mask Technology Center (Germany) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5446
- 発行年:
- 2004
- 開始ページ:
- 384
- 終了ページ:
- 401
- 総ページ数:
- 18
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- 言語:
- 英語
- 請求記号:
- P63600/5446.1
- 資料種別:
- 国際会議録
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