Photomask quality assessment solution for 90-nm technology node

Photomask quality assessment solution for 90-nm technology node

著者名:

Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Chung, D.H.P. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Nobuyuki, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tateno, M. ( NEC Corp. (Japan) )

Matsumura, K. ( NEC Corp. (Japan) )

Chen, J.-H. ( Synopsys, Inc. (USA) )

Luk-Pat, G.T. ( Synopsys, Inc. (USA) )

Fukui, N. ( Synopsys, Inc. (USA) )

Tanaka, Y. ( Synopsys, Inc. (USA) )

さらに 4 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5446

発行年:

2004

開始ページ:

364

終了ページ:

374

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

言語:

英語

請求記号:

P63600/5446.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013798
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2004 : 11th
会議開催地:	Yokohama, Japan
会議開催年:	2004.04.14-2004.04.16

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