Blank Cover Image

257-nm wavelength mask inspection for 65-nm node reticles

著者名:
Yoshikawa, R. ( Toshiba Corp. (Japan) )
Tanizaki, H. ( Toshiba Corp. (Japan) )
Watanabe, T. ( Toshiba Corp. (Japan) )
Inoue, H. ( Toshiba Corp. (Japan) )
Ogawa, R. ( Toshiba Corp. (Japan) )
Endo, S. ( NuFlare Technology, Inc. (Japan) )
Ikeda, M. ( NuFlare Technology, Inc. (Japan) )
Takahashi, Y. ( NuFlare Technology, Inc. (Japan) )
Watanabe, H. ( Toshiba Corp. (Japan) )
さらに 4 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
313
終了ページ:
319
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.1
資料種別:
国際会議録

類似資料:

1 国際会議録 Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection …

Tojo, T., Hirano, R., Tsuchiya, H., Oaki, J., Nishizaka, T., Sanada, Y., Matsuki, K., Isomura, I., Ogawa, R., Kobayashi, …

SPIE - The International Society of Optical Engineering
7 国際会議録 High-performance DUV inspection system for 100-nm generation masks

Tsuchiya, H., Isomura, I., Nakashima, K., Yamashita, K., Watanabe, T., Nishizaka, T., Ikeda, H., Sawa, E., Ikeda, M.

SPIE-The International Society for Optical Engineering
2 国際会議録 High-performance reticle inspection tool for the 65-nm node and beyond

T. -Y. Kang, C. -H. Chen, C. -H. Ho, L. Hsu, Y. -C. Ku, K. Nakamura, H. Moribe, T. Bashomatsu, K. Matsumura, K. Hatta, …

SPIE - The International Society of Optical Engineering
8 国際会議録 Study of alternating phase-shift mask structure for 65-nm node devices

Konishi, T., Komizo, T., Takahashi, H., Morita, M., Ohshima, T., Chiba, K., Kojima, Y., Sasaki, J., Tanaka, K., Otaki, …

SPIE - The International Society of Optical Engineering
3 国際会議録 Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool

Lai, R., Hsu, L., Kung, C.H., Hung, J., Huang, W.H., Yoo, C.-S., Huang, Y.-T., Hsu, V.

SPIE - The International Society of Optical Engineering
9 国際会議録 Advanced reticle inspection challenges and solutions for 65nm node [5992-12]

Kim, W. D., Eickhoff, M. D., Kim, D., McCurley, S.

SPIE - The International Society of Optical Engineering
4 国際会議録 Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]

Kikuiri, N., Murakami, S., Tsuchiya, H., Tateno, M., Takahara, K., Imai, S., Hirano, R., Isomura, I., Tsuji, Y., Tamura, …

SPIE - The International Society of Optical Engineering
10 国際会議録 Half-tone PSM inspection sensitivity of 257-nm light source MC-3000

Tsuchiya,H., Yamashita,K., Sugihara,S., Fujiwara,T., Yoshikawa,R.

SPIE-The International Society for Optical Engineering
5 国際会議録 Optical mask inspection strategy for 65-nm node and beyond

Chung, D.-H.P., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M.

SPIE - The International Society of Optical Engineering
11 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node

Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Chung, D. -H., Ohira, K., Yoshioka, N., Matsumura, K., Tojo, T., Otaki, M.

SPIE - The International Society of Optical Engineering
12 国際会議録 Shot number analysis at 65-nm node mask writing using VSB writer

Hirumi, J., Kuriyama, K., Yoshioka, N., Yoshikawa, R., Hojo, Y., Matuzaka, T., Tanaka, K., Hoga, M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12