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Improving photomask surface properties through a combination of dry and wet cleaning steps

著者名:
Eschbach, F.O. ( Intel Corp. (USA) )
Tanzil, D. ( Intel Corp. (USA) )
Kovalchick, M. ( Intel Corp. (USA) )
Dietze, U.U. ( STEAG HamaTech USA, Inc. (USA) )
Liu, M. ( STEAG HamaTech USA, Inc. (USA) )
Xu, F. ( STEAG HamaTech USA, Inc. (USA) )
さらに 1 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
209
終了ページ:
217
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.1
資料種別:
国際会議録

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