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Analysis of mask CD error by dose modulation for fogging effect

著者名:
Lee, H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, B.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
143
終了ページ:
147
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.1
資料種別:
国際会議録

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