Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

著者名:

Takeshi, K. ( Toppan Printing Co., Ltd. (Japan) )

Ito, N. ( Toppan Printing Co., Ltd. (Japan) )

Inokuchi, D. ( Toppan Printing Co., Ltd. (Japan) )

Nishiyama, Y. ( Toppan Printing Co., Ltd. (Japan) )

Fukushima, Y. ( Toppan Printing Co., Ltd. (Japan) )

Okumoto, Y. ( Toppan Printing Co., Ltd. (Japan) )

さらに 1 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5446

発行年:

2004

開始ページ:

58

終了ページ:

66

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

言語:

英語

請求記号:

P63600/5446.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013798
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2004 : 11th
会議開催地:	Yokohama, Japan
会議開催年:	2004.04.14-2004.04.16

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