Blank Cover Image

Investigation of Cr defect in high Cr load logic mask

著者名:
Jung, H.-Y. ( Hynix Semiconductor Inc. (South Korea) )
Choi, S.J. ( Hynix Semiconductor Inc. (South Korea) )
Kim, M.-S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, D.W. ( Hynix Semiconductor Inc. (South Korea) )
Lee, J. ( Hynix Semiconductor Inc. (South Korea) )
Han, O. ( Hynix Semiconductor Inc. (South Korea) )
さらに 1 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
38
終了ページ:
45
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.1
資料種別:
国際会議録

類似資料:

1 国際会議録 Defects analysis of mask blanks

Lee,D.H., Kim,D.W., Lee,J.K., Jeong,W.G., Choi,S.-S., Jung,S.-M., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Mask defect inspection study with high-speed mask inspection system

Jun, J., Kim, H., Choi, S., Choi, Y. K., Han, O.

SPIE - The International Society of Optical Engineering
2 国際会議録 Investigation of subpellicle defect formation at KrF lithography

Lee, J., Lee, D.W., Kim, M.-S., Jung, H.-Y., Han, O.

SPIE - The International Society of Optical Engineering
8 国際会議録 Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks

Cho,H.-J., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
3 国際会議録 Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Lee, D. W., Jung, H. Y., Kim, M. S., Lee, J. S., Choi, Y. K., Han, O.

SPIE - The International Society of Optical Engineering
9 国際会議録 Required mask specification for mass production devices below 65-nm design node [6349-81]

Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W.

SPIE - The International Society of Optical Engineering
4 国際会議録 Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
10 国際会議録 Comparative evaluation of mask production CAR development processes with stepwise defect inspection

Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, …

SPIE-The International Society for Optical Engineering
5 国際会議録 Optical performance enhancement technique for 45-nm-node with binary mask

J. Jung, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
11 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
6 国際会議録 Study of Cr patch validity for ArF CPL mask and its fabrication

Kim, C.-H., Kim, S.-H., Lee, M.-S., Park, J.-S., Shin, I.-G., Choi, S.-W., Yoon, H.-S., Han, W.-S.

SPIE - The International Society of Optical Engineering
12 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks

Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12