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Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors

著者名:
Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yeh, L.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lien, T.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chuo, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
さらに 3 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
28
終了ページ:
37
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.1
資料種別:
国際会議録

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